Optical Diagnostics for Thin Film Processing
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Epub Optical Diagnostics For Thin Film Processing 1996
It may takes up to minutes before you received it. Please note you need to add our NEW email km bookmail. Figures and Topics from this paper. Citations Publications citing this paper. Chojnacka , Charles T.
Optical Diagnostics For Thin Film Processing 1996
Avedisian , Andreas Rendtel. Remote sensing of a low pressure plasma in the radio near field Sean Q.
Kelly , Patricia McNally. Influence of discharge power on the intensities of Ar and Ti in high-pressure magnetron sputtering plasma measured using optical emission spectroscopy Soo Ren How , Nafarizal Bin Nayan , Jais Bin Lias. A study of defect generation phenomena in single crystalline silicon substrate during plasma processing and the characterization techniques Yoshinori Nakakubo.
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Diagnostics and modelling of atmospheric pressure chemical vapour deposition reactors Martin Christoph Hehn. References Publications referenced by this paper. About the book. Search in this book.
This volume describes the increasing role of in situ optical diagnostics in thin film processing for applications ranging from fundamental science studies to process development to control during manufacturing. The key advantage of optical diagnostics in these applications is that they are usually noninvasive and nonintrusive.
Optical probes of the surface, film, wafer, and gas above the wafer are described for many processes, including plasma etching, MBE, MOCVD, and rapid thermal processing. For each optical technique, the underlying principles are presented, modes of experimental implementation are described, and applications of the diagnostic in thin film processing are analyzed, with examples drawn from microelectronics and optoelectronics. Special attention is paid to real-time probing of the surface, to the noninvasive measurement of temperature, and to the use of optical probes for process control.
Optical Diagnostics for Thin Film Processing is unique.